Research scientist, TNO Technical Sciences
Rodolf Herfst got his MSc in Applied Physics at the Technical University Eindhoven in 2004. He received his PhD (2008) at the University of Twente on the research he carried out at NXP Semiconductors on the subject of “Reliability of RF MEMS capacitive switches”. He continued to specialize in semiconductor reliability and RF characterization; first as a postdoctoral researcher (2009-2010), later at NXP Semiconductors (2010-2012). Currently he works as research scientist at TNO Technical Sciences. His research interests encompass atomic force microscopy, metrology for semiconductor industry, nano-fabrication, and optomechatronic systems. He has contributed to the parallel atomic force microscopy system currently under development as well as various other projects. Currently he also contributes to TNO’s early research programme for 3D nanomanufacturing instruments.